http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I224150-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_01e48e78fadaaec045333f9ad5a6e0b5 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-136 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-151 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-00 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
| filingDate | 2001-02-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2004-11-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_21fdb0399a0d7d344cf129e5e8e306bd http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4522ccd71ef0d26ffcf425f1f2903565 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2f3f49cc5158e14fb4fce45e82903942 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b1f5642b1d3469a67015c1b9fe8465bf |
| publicationDate | 2004-11-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-I224150-B |
| titleOfInvention | Methods of forming precursor for use in manufacturing integrated circuits and precursors and obtained therefrom, and light attenuating compound and method of forming the same |
| abstract | An improved method for applying organic antireflective coatings to substrate surfaces and the resulting precursor structures are provided. Broadly, the methods comprise chemical vapor depositing (CVD) an antireflective compound on the substrate surface. In one embodiment, the compound is highly strained (e.g., having a strain energy of at least about 10 kcal/mol) and comprises two cyclic moieties joined to one another via a linkage group. The most preferred monomers are [2.2](1,4)-naphthalenophane and [2.2](9,10)-anthracenophane. The CVD processes comprise heating the antireflective compound so as to vaporize it, and then pyrolizing the vaporized compound to form stable diradicals which are subsequently polymerized on a substrate surface in a deposition chamber. The inventive methods are useful for providing highly conformal antireflective coatings on large substrate surfaces having super submicron (0.25 mum or smaller) features. |
| priorityDate | 2000-02-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 112.