http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I224077-B

Outgoing Links

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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C1-00126
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H03H3-0072
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B81B3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H03H3-007
filingDate 2002-06-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2004-11-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_40c15bd63ef960f91ca01773e249083b
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publicationDate 2004-11-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-I224077-B
titleOfInvention Sacrificial layer technique to make gaps in MEMS applications
abstract A method comprising over an area of a substrate, forming a plurality of three dimensional first structures; following forming the first structures, conformally introducing a sacrificial material over the area of the substrate; introducing a second structural material over the sacrificial material; and removing the sacrificial material. An apparatus comprising a first structure on a substrate; and a second structure on the substrate and separated from the first structure by an unfilled gap defined by the thickness of a removed film.
priorityDate 2001-06-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 22.