http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I221634-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0035 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 |
| classificationIPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2003-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2004-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_73f447e427e142b0614cd9ae99816738 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e4900f5107982c3eaa801f05ac37a016 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_853861c0b322e06c4a82d380374b3c87 |
| publicationDate | 2004-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-I221634-B |
| titleOfInvention | Forming method of fine pattern |
| abstract | The present invention provides a kind of fine pattern forming method, which includes the followings: the step of coating the fine-pattern formation agent on the substrate having photoresist (PR) pattern; the step of removing the unnecessary coating formation agent adhered at the edge portion and/or inside portion of the substrate; the step of conducting heat treatment to shrink the coating formation agent so as shrink the separation in between PR patterns after using the thermally shrinking effect; and the step of substantially removing the coating formation agent. Through the invention, a kind of fine pattern formation method, which can have excellent pattern size control, excellent outlook and the required characteristic of semiconductor device for the fine patter so as to prevent particle generation caused by the apparatus contamination, is provided. |
| priorityDate | 2002-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 157.