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filingDate 1998-10-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2004-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c826882a16a22660c91ec280f2b9955e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_44e4962792b30bf2cc84a7a9af1417b1
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publicationDate 2004-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-594442-B
titleOfInvention Resist removing method and apparatus
abstract A resist removing method and a resist removing apparatus using the method. The resist removing method includes providing a substrate and forming a resist on the substrate. Then the substrate is brought into contact with a resist removing agent comprising N alkanol alkoxy alkanamide, to remove the resist from the substrate. Alternatively, the substrate is brought into contact with a resist removing composition that may comprise N alkanol alkoxy alkanamide with an attack inhibitor, or alkanolamine and alkyl alkoxy alkanoate. Since the resist can be removed by a simple process in a short time, and since the resist removing apparatus can be reduced in size, the productivity of a semiconductor device fabrication facility can be enhanced.
priorityDate 1998-08-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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