http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-594406-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 1999-02-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2004-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aae7347d038359d8d74eeeeb4eb18786 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c3d17b3b234ed1afa3d09270b5937c01 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bc396555fddda634d3b611c26022cda0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bee0cbfeef64466cfe5befec1c7705de http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_22691f78e0679dc391e7172ba32d0b66 |
| publicationDate | 2004-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-594406-B |
| titleOfInvention | Irradiation sensitive positive-tone resists using polymers containing two acid sensitive protecting groups |
| abstract | The present invention is directed to a high-performance irradiation sensitive resists and to a polymer resin composition useful for making the same. In accordance to the present invention, the polymer resin comprises a dual blocked polymer resins. Specifically, the dual blocked polymer, resin comprises at least two different acid labile protecting groups which block some, but not all, of the polar functional groups of the polymer resin. A chemically amplified resist system comprising said dual blocked polymer resin; at least one acid generator; and a solvent is also provided herein. The present invention is also directed to a high-performance irradiation sensitive positive-tone resist and to a method of formulating the same. In one aspect, the polymer resin composition of the present invention comprises a blend of at least two miscible aqueous base soluble polymer resins, wherein one of said aqueous base soluble polymer resins of said blend is partially protected with a high activation energy protecting group and the other aqueous base soluble polymer resin of said blend is partially protected with a low activation energy protecting group. A chemically amplified resist system comprising said polymer resin composition; at least one acid generator; and a solvent is also provided herein. |
| priorityDate | 1998-02-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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