| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d93502a23a72b56472bc75854cfe7c60 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K59-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K71-221
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K71-60 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02282
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02118
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L61-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0226
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-312 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L51-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L51-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L61-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 |
| filingDate |
2001-05-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2004-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0f8d04df16ade713b7643a718e4cf91e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f34387848eb0bf1915a54039b12ee54e |
| publicationDate |
2004-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-594395-B |
| titleOfInvention |
Photoresist composition for insulating film, insulating film for organic electroluminescent element, and process for producing the same |
| abstract |
The present invention provides a photoresist composition suitable to be the insulating film of an organic electroluminescent element and providing the insulating film with an enlarged skirt shape. A photoresist composition comprises (A) an alkali-soluble resin, (B) a quinodiazidosulfonate, and (C) an organic solvent containing heat-curable compounds. The insulating film of an organic electroluminescent element has a thickness of 0.3 to 3 mum and has a upper edge of roundly enlarged skirt shape which is form by heat-treating the resist film formed on substrate by photolithography. The insulating film is produced by using the above photoresist composition. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I450032-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103365079-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102047178-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103365079-B |
| priorityDate |
2000-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |