| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0758
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate |
2001-12-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2004-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_464180103f87187b3aab20511a8537b7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_011a1a34e0710f341a81c9dd1d273ea7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2cb048b86304949d908d7c33ed66073c |
| publicationDate |
2004-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-594383-B |
| titleOfInvention |
Positive resist composition for electron beam |
| abstract |
Provided is chemically amplified positive resist composition for electron beam, which may improve the resist pattern profile thereof and the line width variation during the pulling and placing in a vacuum chamber. A chemically amplified positive resist composition for electron beam comprises a resin having an specifically structured acid-decomposable group and being decomposable by the action of an acid and thereby whose solubility in an alkali developing solution is increased, and a compound which generates an acid when exposed to active light or radiation. |
| priorityDate |
2001-02-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |