http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-591686-B

Outgoing Links

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-455
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classificationIPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44
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filingDate 2002-08-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2004-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eb7fb9ab5c4e7a6f87d8f4476453f035
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_348ce0f8400fd4b0cd576ae962b7825e
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publicationDate 2004-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-591686-B
titleOfInvention Process chamber having multiple gas distributors and method
abstract A substrate processing chamber has a substrate support to support a substrate, and an exhaust conduit about the substrate support. A first process gas distributor directs a first process gas, such as a non-reactive gas, about the substrate perimeter and toward the exhaust conduit at a first flow rate to form a curtain of non-reactive gas about the substrate. A second process gas distributor directs a second process gas, such as reactive CVD or etchant gas, toward a central portion of the substrate at a second flow rate which is lower than the first flow rate. A gas energizer energizes the first and second process gases in the chamber. A controller operates the substrate support, gas flow meters, gas energizer, and throttle valve, to process the substrate in the energized gas.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111341689-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I732373-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111341689-B
priorityDate 2001-08-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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Total number of triples: 23.