http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-591339-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4283a2f8ade5dc582d75300427a38e50 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G63-676 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-06 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-037 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G63-676 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G63-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G59-42 |
| filingDate | 2002-10-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2004-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6693d146573e2b5b91fec8d7de642108 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ac90a799f35b7126d059df1894a87e34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f1e65a946e5785b9325d60ecec998cad |
| publicationDate | 2004-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-591339-B |
| titleOfInvention | Photo-polymerisable unsaturated resin, their process for producing it and alkali-soluble radiation-sensitive resin component using it |
| abstract | The present invention provides an alkali-soluble radiation-sensitive resin and the component comprising it. The present invention provides a photo-polymerisable unsaturated resin, which the quantitative average molecular weight is upon 1,500, wherein is obtained by the reaction from the mole ratio of dicarboxylanhydride and tetracarboxylanhydride of 1:99 to 65:35, formula (1): (wherein, X repressed bisphenol (or bismethylphenol) fluorene-type epoxyacrylic acid derivate, n is a number from 1 to 20, Y is the residue except the anhydride of dicarboxylanhydride, Z is the residue except the anhydride of tetracarboxylanhydride), and the alkali-soluble radiation-sensitive resin component having the resin thereof. The coating filter consisting of the components thereof has the excellent properties of heat-resistance, transparency, exposure-developing, chemical resistance etc. |
| priorityDate | 2001-11-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 170.