http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-588220-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bb4ee28d43b5e8d4a3c5141fa9bcfeb0 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0758 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-108 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F20-22 |
| classificationIPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2001-04-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2004-05-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7695a881a9ee57f99d15b41617df31d0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b3c7acfbd485f344276629696ed584ff http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0698f82a780b5989637b873a055c597d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_67b7ef4e85229771c75657a052debcd7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_58436a7789c2abaadb34a714cac8e91f |
| publicationDate | 2004-05-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-588220-B |
| titleOfInvention | Novel fluorine-containing polymer having group reactive with acid and chemically amplifying type photo resist composition prepared by using same |
| abstract | To provide a novel fluorine-containing polymer having a group reactive with an acid and being high in transparency against energy rays (radiation) of vacuum ultraviolet region (157 nm), a material for fluorine-containing base polymer which is prepared by using the polymer and is suitable for photo resist, and a chemically amplifying type resist composition prepared therefrom. The fluorine-containing polymer is represented by the formula: -(M1)-(M2)-(A)-, wherein M1 is a structural unit having function al group dissociative and decomposable with an acid, M2 is a structural unit of fluorine-containing acrylic ester, A is a structural unit derived from other copolymerizable monomer. The polymer has a number average molecular weight of 1,000 to 1,000,000 and comprises 1 to 99% by mole of structural unit M1, 1 to 99% by mole of structural unit M2 and 0 to 98% by mole of structural unit Al, in which a proportion of M1/M2 is 1 to 99/99 to 1% by mole. The material for fluorine-containing base polymer which is suitable for photo resist contains a fluorine-containing polymer having a group reactive with an acid such as the above-mentioned polymer. The chemically amplifying type resist composition is prepared therefrom. |
| priorityDate | 2000-04-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 439.