| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8cf8d77ac0eff1767b22d2fb9445b64d |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31138
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-427 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311 |
| filingDate |
2002-02-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2004-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7a8109e9f9ba913e17c19cc79a276efb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e95227680aabf6f46da519b57daa7821
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_60520a58785d410e1798ea57fc793157 |
| publicationDate |
2004-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-574603-B |
| titleOfInvention |
Post-etch photoresist strip with O2 and NH3 for organosilicate glass low-k dielectric etch applications |
| priorityDate |
2001-02-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |