http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-574402-B
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fb78b459e21bb4fd52850a12cab27387 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D211-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D241-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D265-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D207-02 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F19-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-34 |
filingDate | 2001-11-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2004-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1e939baa125253597c8d42218d9afcac |
publicationDate | 2004-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | TW-574402-B |
titleOfInvention | Precursor compounds for metal oxide film deposition and methods of film deposition using the same |
abstract | Disclosed are precursor compounds useful for deposition of a metal oxide film, which is applied to a capacitor of electronic elements such as semiconductor, to a substrate such as silicon, and a process for depositing such film. The precursor compounds have the formula (1), wherein M is a metal element selected the groups 2A, 3A, 4A, 5A, 3B, 4B, 5B and 8B of the Periodic Table; x and y are integers of 1 to 4, provided that the sum of x and y is an integer of 2 to 5; R is hydrogen, fluoro, alkyl group containing 1 to 4 carbon atoms, perfluoroalkyl group or perfluoroaryl group; R1 and R2 independently are an alkyl group containing 1 to 8 carbon atoms, perfluoroalkyl group or alkoxyalkyl group; A is perfluoroalkylalkoxy or alkoxyalkylalkoxy having the formula (2): -O-(CHR3)l-(CR4R5)m-R6, wherein R3 is hydrogen, fluoro, or alkyl or perfluoroalkyl having 1 to 4 carbon atoms; R4 and R5 are the same or different and are hydrogen, fluoro, or alkyl or alkoxy having 1 to 4 carbon atoms; R6 is alkyl or perfluoroalkoxy having 1 to 4 carbon atoms, or an amide group; l and m are integers of 0 to 4; L is a Lewis base; and n is an integer of 0 or more. |
priorityDate | 2000-07-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 107.