http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-567542-B

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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-317
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-265
filingDate 2002-10-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2003-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8df6c860997347af95ece3b8214dee30
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publicationDate 2003-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-567542-B
titleOfInvention Methods and apparatus for plasma doping by anode pulsing
abstract Methods and apparatus are provided for plasma doping of a workpiece. The plasma doping apparatus includes a housing defining a plasma doping chamber, a platen for supporting a workpiece in the plasma doping chamber, an anode spaced from the platen in the plasma doping chamber, a process gas source coupled to the plasma doping chamber, a vacuum vessel enclosing the plasma doping chamber and defining an outer chamber, a primary vacuum pump connected to the vacuum vessel, a pulse source for applying pulses to the anode, and a controller. The controller establishes a controlled plasma doping environment in the plasma doping chamber in a first mode, typically a plasma doping mode, and establishes a gas connection between the plasma doping chamber and the outer chamber in a second mode, typically a vacuum pumping and wafer exchange mode.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I385718-B
priorityDate 2001-10-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 23.