http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-541324-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7ef01e33058cf740cf2197991be97af1 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G73-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-037 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-46 |
| filingDate | 2001-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2003-07-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ed410d3daced77ae95e722eb3f8cfab4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ed076a499d8114e9f976ad28bc9ccdbe http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1a39b30af9bcc671fe0eea8f4aad864a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b59d92fb3f952cc8e0fc72f903749f7d |
| publicationDate | 2003-07-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-541324-B |
| titleOfInvention | Polyimide and method of producing it, polyamic acid and method of producing it, and photoresist and insulation film composed thereof |
| abstract | A polyimide having a repeating unit of the general formula (I) and a polyamic acid having a repeating unit of the formula (IV): (wherein, R1 and R2 represent H or a C1 to C20 alkyl group, and Z represents a condensed polycyclic aromatic group or an group of the following formulae: Herein, X represents -CO- or -C(=N2)-, Y represents a direct bond, -CH2-, -O-, -SO2-, -S-, -CO- or -C(=N2)-, and W represents a direct bond, -CH2-, -C(CH3)2-, -C(CF3)2-, -S-, -SO-, -SO2- or -O-. b, m and n are 0 or 1; r is a C1 to 4 alkyl group, halogen group or phenyl group; a is 0 or 1 to 3.). |
| priorityDate | 2000-04-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 329.