http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-538315-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D498-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D213-643 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L101-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-00 |
| filingDate | 2001-11-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2003-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1e8c6788d846774f20e5ac920e2e11e3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2cb048b86304949d908d7c33ed66073c |
| publicationDate | 2003-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-538315-B |
| titleOfInvention | Positive resist composition |
| abstract | To provide a positive resist composition, preferably a positive resist composition for using F2 excimer laser radiation (157 nm) as the exposing light source. Specifically, to provide a positive resist composition, which expresses sufficient transparence while use a light source of 157 nm, and having satisfied properties of coating and imaging defect, as well as further providing a positive resist composition for forming a pattern with good sensitivity and resolution and excellent oxygen-plasma resistance. The invention provides a positive resist composition, which comprising (A) resins having a structure with main chain and/or side chain of polymer frame being substituted by fluorine, as well as containing a repeated structure unit consisting of silicone groups, and having increased solubility to be decomposed in alkali developing solution through the efficiency of acid, and (B) positive resist composition consisting a compound being able to produce an acid by exposing to an active light ray or radiation. |
| priorityDate | 2000-11-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 345.