http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-533452-B
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5547f741b25666fc4ae5195cf71a979b |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L28-84 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-8242 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-285 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-108 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 |
filingDate | 1998-11-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2003-05-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4a9992320b93c77890918c9187f972f4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0e6baddfd0571cdd6f75cad3703f0f84 |
publicationDate | 2003-05-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | TW-533452-B |
titleOfInvention | Manufacturing device and method of semiconductor device |
abstract | This invention discloses a method of manufacturing a semiconductor device that has an amorphous-silicon film onto which hemispherical grains are grown, which comprises first cleaning a silicon wafer at an elevated temperature using ammonia hydrogen peroxide water solution; next cleaning the silicon wafer at an elevated temperature using chlorine hydrogen peroxide water solution; then immersing the silicon wafer in dilute hydrofluoric acid solution; afterwards, rinsing the silicon wafer with pure water; next drying the amorphous-silicon film surface of the wafer by using isopropyl alcohol. |
priorityDate | 1997-11-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 43.