http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-527521-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fd174aedc2957e592543f80c613b5f3c |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-075 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0233 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0226 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-08 |
| filingDate | 2000-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2003-04-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_974dae9012749bbdd1ac5bb2b9cfcd61 |
| publicationDate | 2003-04-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-527521-B |
| titleOfInvention | Active particle, photosensitive resin composition, and process for forming pattern |
| abstract | Each of the active particles of the present invention comprises a particulate carrier and an aromatic unit which is directly or indirectly bonded thereto and, with the aid of a developer (e.g., an alkali), becomes interactive or reactive to the photosensitizer. The active particles are used in combination with a photosensitizer contained in a photosensitive resin. For the purpose of enhancing the interactivity with a photosensitizer with the aid of a developer (e.g., alkali), the aromatic unit may have no substituent at least either in the o-position or p-position in relation to the phenolic hydroxyl group. The mean particle size of the particulate particles is about 1 to 100 nm. So that the active particles, as a result of a reaction with a photosensitizer in non-exposed areas, makes a difference in solubility between non-exposed areas and exposed areas, the addition of such active particles is useful in forming a pattern. According to the present invention, it is possible to largely improve sensitivity and resolution even in the case a conventional resist or lithography technique. |
| priorityDate | 1999-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 175.