| abstract |
This base cloth is a complex of a fibrous base material composed of a bundle of fiber formed by bundling 20 or more pieces of extra fine fiber, and a macromolecular elastic material packed in pores of the fibrous base material, an average diameter d1 of the extra fine fiber within a range of 1/2 radius from a center of the bundle of fiber is 0.3-10 μm, an average diameter d2 of the ultra fine fiber of an outer peripheral part is 0.05-1 μm, d1 is 1.5 time or more of d2, and a weight ratio of the macro-molecular elastic material to the fibrous base material is 10/90 or more. To provide a base cloth for polishing capable of uniformly polishing a surface of a substrate without forming a deep groove (scratch) on the surface of the substrate by the variation of a polishing condition in precision polishing such as texturing work onto a surface of a magnetic recording medium or the like. |