http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-520528-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_aea8583efc4aa4e2a9706d789804d37b |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2001-12-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2003-02-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_033f4c46ba8b2b4f484e119f762f32ec http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8882990e38ffebaca2047341cad402ef |
| publicationDate | 2003-02-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-520528-B |
| titleOfInvention | Method for eliminating corner round profile of the RELACS process |
| abstract | Forming a patterned photoresist over a substrate, herein numerous ions are formed during the formation of the patterned photoresist. Treat the patterned photoresist to increase the ions density at the top of the patterned photoresist. Cover the patterned photoresist by a reactive layer, wherein the reaction between the reactive layer and the ions forms a crosslinked layer over the patterned photoresist. Remove non-crosslinked portions of the reactive layer. The treatment could be thermal treatment and/or illumination, and could be performed after the reactive layer is covered. |
| priorityDate | 2001-12-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 28.