| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_be055db3c1a09879df07379ba969e223 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3105
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31051
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76819 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3105 |
| filingDate |
2001-10-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2003-01-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4cdd139ea6e212b050c54fc6f2246ed9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3c227385de57a4cdfddedb2fc25019f1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cc0c2ed1b0b579bb2f5d3b9b3f6fd75e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a2d79dc0e263f8077eef443959bb3dce |
| publicationDate |
2003-01-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-517285-B |
| titleOfInvention |
Method for fabricating semiconductor device |
| abstract |
There is without integral steps generating and flat surface film can be formed on the whole substrate by this invention. After a fluid material is provided to a substrate 1 surface on which a stepped layer 2 is formed to generate a fluid film 3, the fluid film is flattened by pressing it against the substrate by means of a press member 4 having a flat pressing face. The fluid film 3 is then heated in this state and solidified, thus forming a solidified film having a flat surface. |
| priorityDate |
2000-11-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |