| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_80787665b837ed3eb503bbcd27c0043a |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-56 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-80
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-60
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-54
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-68
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-70 |
| filingDate |
2001-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2003-01-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1bed702d5a4d1e1e9e095808b737ef89
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_09220d7f052ea07478eb2bcfcf6fcdb8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5358acc4b136ba98dc5f6366e374ffe0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bf25699f936c429d2960c96b3d580863
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4c08fc04b767fa123e5d79b3662d001b |
| publicationDate |
2003-01-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-516112-B |
| titleOfInvention |
Photomask and its manufacturing method, forming method of pattern, and manufacturing method of semiconductor device |
| abstract |
The subject of the present invention is to develop a small quantity of various kinds of semiconductor devices in a short time and to realize a photomask suitable to be manufactured with low cost. The solving means of the invention is described in the following. A shade pattern 2 of a photomask M is constituted by a photoresist film containing micro-particles such as carbon in an organic film. A pattern is transferred to the photoresist 6 on a semiconductor wafer 5 by means of the reducing projection exposure treatment of the photomask M. When performing the exposure treatment, it is possible to select exposure light within a range of wide wavelengths including I-line, KrF excimer laser beam and ArF excimer laser beam. |
| priorityDate |
2000-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |