| abstract |
A polymeric compound of the invention includes at least one monomer unit selected from the following formulae (I), (II), (III) and (IV): (in which R1 is a hydrogen atom or a methyl group, R2 and R3 are each a hydrogen atom, a hydroxyl group or a -COOR4 group, where R4 is, e.g., a t-butyl group or a 2-tetrahydropyranyl group; R5 and R6 are each a hydrogen atom, a hydroxyl group or an oxo group; R7, R8 and R9 are each a hydrogen atom or a methyl group; R10 and R11 are each a hydrocarbon group having 1 to 8 carbon atoms; R12, R13 and R14 are each a hydrogen atom, a hydroxyl group or a methyl group, where if all of R12 to R14 are each a hydrogen atom or a hydroxyl group, R10 and R11 are not coincidentally methyl groups) [in which, when the compound includes, for example, a monomer unit of formula (III), the compound further includes at least one monomer unit selected from among, for example, a monomer unit represented by the following formula (V): (in which R15 and R16 are each a hydrogen atom, a hydroxyl group or a carboxyl group; R17 is a hydroxyl group, an oxo group or a carboxyl group; and R1 has the same meaning as defined above)]. This polymeric compound has excellent transparency, alkaline solubility, adhesion, and high etching resistance, and can be used as a photoresist resin. |