http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-505823-B
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_36f8253f3d0d59bcd9259217d4385d10 |
classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-32 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-30 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-00 |
filingDate | 2001-01-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2002-10-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_57dd59004598bb54e431e29d9bd09b78 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0af87088bde725bf4f5da3ac03cb7781 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ef189f811dee73ae5b6d71e805509352 |
publicationDate | 2002-10-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | TW-505823-B |
titleOfInvention | Phase-mask |
abstract | This invention relates to a phase-mask (1) to expose a photo-sensitive layer in a photolithographic process to produce integrated circuits with a pro-determined pattern of light-transmitted regions. The phase-mask, is in the areas (3), in which the distances of the adjacent regions in at least one space-direction is smaller than a pro-given limit-distance, respectively constructed as an alternative phase-mask. The areas (4) with isolated contact-windows (2) are respectively constructed as a semitone-phase-mask or chrome-less phase-mask. |
priorityDate | 2000-01-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 197.