http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-499703-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4401 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-507 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-507 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44 |
| filingDate | 2001-07-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2002-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6f7cb92f48abe25af89160ccc53f7d33 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a146b05b942ee2720fa86b2310dc32be |
| publicationDate | 2002-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-499703-B |
| titleOfInvention | Adapter, chamber and plasma treatment device |
| abstract | A CVD device 1 of the present invention has a chamber 50 wherein a dome 5 is combined to an upper end of a tubular body 2. The body 2 is provided with a gas inlet 8a whereto film formation gas such as SiH4 is introduced and the dome 5 is provided with a gas inlet 8b. A disc-like adapter 9 is disposed in opposition in a circumference of the gas inlet 8a in an inner surface of the dome 5. Thereby, a space is formed between the adapter 9 and the dome 5 and the space becomes a heat insulation layer, thus restraining a temperature drop for the adapter 9 which is heated once. Thereby, reduction of reactivity between by-product attaching to the adapter 9 and fluorine radical is prevented and removal efficiency of by-product can be raised. |
| priorityDate | 2000-07-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 20.