| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f0f3dc2904bb912b0161be7d912e274f |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61L2-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B5-208
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B65B25-008
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61L12-063 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B65B25-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61L2-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G21K5-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61L12-06 |
| filingDate |
2000-08-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2002-04-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c3b07c8ec3f015ab76e67fb120fba2d8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9ed77983cec2adc8919d634d9a4936ab
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_06fd46a8a36d27612c19669b8aea828d |
| publicationDate |
2002-04-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-484142-B |
| titleOfInvention |
UV radiation system having materials for selectively attenuating radiation |
| abstract |
This invention provides a high energy radiation system which produces UV radiation comprising a selectively attenuating material which increases the ratio of desired to undesired radiation to reduce the radiation damage to a target by selectively attenuating at least 30 percent of the radiation from greater than 200 up to 240 nm which impinges upon said attenuating material, and directs greater than 50 percent of the radiation from 240 nm to 280 nm which impinges upon said attenuating material. |
| priorityDate |
1999-07-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |