Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_98a3cec9cda773a66dcdd83efef311ff |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/E04H17-163 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J11-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J11-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J11-36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J11-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1333 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J9-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G09F9-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-30 |
filingDate |
1999-05-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2002-02-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4d35abd3146e5aa3afc47eb90bc32fe6 |
publicationDate |
2002-02-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
TW-476864-B |
titleOfInvention |
Method for forming isolation wall |
abstract |
The invention is related to a method for forming an isolation wall having sufficient height and precision for plasma display, which has patterns perfectly developed without any break and fully removes non-pattern portions when developing photosensitive composition for plasma display. The method for forming an isolation wall for plasma display is characterized in applying pressure on water or alkali aqueous solution and injecting them on inorganic particulates having photosensitive composition which are painted on a substrate 15 to 300 micron thick and exposed to form patterns, and also removing dissolved residue by injecting pressure to develop at the same time. |
priorityDate |
1998-06-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |