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filingDate 1999-10-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2002-01-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8ca342c1e39291a0665c423ba8a9dc4c
publicationDate 2002-01-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-473565-B
titleOfInvention Production of bulk single crystals of silicon carbide
abstract Bulk, low impurity silicon carbide single crystals are grown by deposition of vapor species containing silicon and vapor species containing carbon on a crystal growth interface. The silicon source vapor is provided by vaporizing liquid silicon and transporting the silicon vapor to a crystal growth crucible. The carbon vapor species are provided by either a carbon containing source gas (for example, CN) or by flowing the silicon source vapor over or through a solid carbon source, for example flowing the silicon vapor through porous graphite or a bed of graphite particles.
priorityDate 1998-10-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 35.