http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-468053-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2baf849d216e689ecc40ccc931a7a7bc |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31612 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31667 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31663 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C17-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C17-30 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D183-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D183-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C17-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B1-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B1-111 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B1-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C17-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D5-00 |
| filingDate | 2000-11-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2001-12-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_50eb8240ef3f2bcb0d209ac6b5884e2f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_da424ca0877cd0717a468cb98126b375 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d1b795b6b810687e8ced11a2757abcb8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_84400edc82a126124edc22d8da891362 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5061b4fd628c04cc5672a726d8a971f6 |
| publicationDate | 2001-12-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-468053-B |
| titleOfInvention | Antireflection film, process for forming the antireflection film, and antireflection glass |
| abstract | An antireflection film having a refractive index of from 1.33 to 1.38 and a contact angle of water of at most 40 DEG which is formed as adhered to a glass surface, by preparing a reaction mixture comprising a silicon compound (A) of the following formula (1): Si(OR)4, wherein R is a C1-5 alkyl group, a silicon compound (B) of the following formula (2): R1Si(OR2)3, wherein R1 is a C1-18 organic group, and R2 is a C1-5 alkyl group, an alcohol (C) of the following formula (3): R3CH2OH, wherein R3 is a hydrogen atom or an unsubstituted or substituted C1-12 alkyl group, and oxalic acid (D), in a ratio of from 0.05 to 4.5 mol of the silicon compound (B) per mol of the silicon compound (A), in a ratio of from 0.5 to 100 mol of the alcohol (C) per mol of the total alkoxy groups contained in the silicon compounds (A) and (B), and in a ratio of from 0.2 to 2 mol of the oxalic acid per mol of the total alkoxy groups contained in the silicon compounds (A) and (B); heating the reaction mixture at a temperature of from 50 to 180 DEG C until the total amount of the silicon compounds (A) and (B) remaining in the reaction mixture becomes at most 5 mol%, while maintaining a SiO2 concentration of from 0.5 to 10 wt% as calculated from silicon atoms in the reaction mixture and maintaining absence of water, to form a polysiloxane solution; coating the polysiloxane solution on a glass surface to form a coating film; and thermosetting the coating film at a temperature of from 480 to 520 DEG C. |
| priorityDate | 1999-12-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 114.