| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0950e9df7f0e1b73efee1bda859951ad |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05C5-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D1-28 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05C5-002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05C5-007 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D1-28 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05C11-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D1-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05C11-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05C9-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05C5-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05C5-00 |
| filingDate |
2000-04-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2001-11-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ff5233880dda4c0c0e16ffe428dad0b3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8e6e7aba41ff8622f41e9bcb08b3725e |
| publicationDate |
2001-11-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-464920-B |
| titleOfInvention |
Substrate processing device and applicable processing method of substrate |
| abstract |
The substrate processing method of the invention provides the following procedures; provide an solution delivery unit having roughly parallel or declined solution delivery plane with respect to the roughly horizontal main plane of the processed substrate, allowing the solution supply machine to feed solution with respect to the solution delivery plane; by means of the open liquid surface on the solution delivery plane, the solution delivery unit enables the fed solution from the solution supply machine to flow in contrast to the relative moving of the substrates to be processed. With the relative motion of solution delivery unit and the substrate to be processed, solution fed from solution supply machine and flowing on the solution delivery plane is supplied to the whole main plane of the substrate to be processed with flowing speed and the status of lowering supply pressure. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109414801-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10967483-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11077536-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I382487-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109414801-A |
| priorityDate |
1999-04-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |