http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-461916-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1436 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G79-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-58 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G79-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G79-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J5-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 |
| filingDate | 1999-11-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2001-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_55376e1837da0b73561c2a0779c62c21 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_317edfec8315fae9be98ea22aa18064a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8382f19a5bb23f13b53ac198ffadc45b |
| publicationDate | 2001-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-461916-B |
| titleOfInvention | Polymer particles and polishing material containing them |
| abstract | The polymer particles of the invention are characterized by being obtained by polycondensation of at least one from among compound 1 represented by general formula (1), its hydrolysates and its partial condensates, and at least one from among Compound 2 represented by general formula (2), its hydrolysates and its partial condensates, and by having a mean particle size of 3-1000 nm. M(OR1)z (1); (R2)nM(OR3)z-n (2), where M is Al, Si, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ge, Zr, Nb, Mo, Sn, Sb, Ta, W, Pb or Ce; z is the atomic valence of M; R1 and R3 are each an alkyl group of 1-5 carbon atoms, an acyl group of 1-6 carbon atoms or an aryl group of 1-9 carbon atoms; R2 is a monovalent organic group of 1-8 carbon atoms; n is an integer of from 1 to (z-2); and R1, R2 and R3 may be the same or different. Polishing materials of the present invention contain the polymer particles and water, and therefore exhibit excellent polishing performance (particularly chemical mechanical polishing performance) as aqueous polishing materials. |
| priorityDate | 1998-11-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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