http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-460484-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J11-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J11-36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J9-20 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K11-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J9-227 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-20 |
| filingDate | 1998-12-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2001-10-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3b89cdc9619d7212792c3e3f99214878 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_142f92c8fcb0f6ffb317b93785946098 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_05048a398adfd35aa8634ba9343c3f03 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7c555b4775438c7f68d1989c240e895d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4566e477ce3657aab1dde528ff23a26d |
| publicationDate | 2001-10-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-460484-B |
| titleOfInvention | Process for preparing phosphor pattern, photosensitive element for forming phosphor pattern, phosphor pattern prepared by the process and back plate for plasma disply panel |
| abstract | To obtain a photosensitive element which is capable of forming phosphor patterns having excellent suppression of edge fusion and embeddability into the spaces of a substrate having ruggedness, such as substrate for a PDP, etc., and having high accuracy and a uniform shape at a good yield and workability, the phosphor pattern having the high accuracy, the uniform shape and excellent luminance and a rear surface plate for a plasma display panel having these phosphor patterns. This process includes respective stages of (I) a stage of forming (A) a photosensitive resin compsn. Layer phoshoors and (C) a resin layer particulates on a substrate 1 having ruggedness, (II) a stage for imagewise irradiating (C) the resin layer the (C) particulates and (A) the photosensitive resin compsn. Layer the phosphors with active light, (III) a stage for forming patterns by removing (C) the resin layer the particulates and selectively removing (A) the photosensitive resin compsn. Layer the phosphors and (IV) a stage for removing an org. component by backing. |
| priorityDate | 1997-12-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 111.