Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-35 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76877 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-203 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-358 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-321 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-165 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-345 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-35 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-285 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-203 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 |
filingDate |
1998-01-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2001-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4c87e87983beb6c1c47648bec5559e33 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_34fbbc1bfd7dd994910c27b73897a009 |
publicationDate |
2001-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
TW-454248-B |
titleOfInvention |
A method and apparatus for enhancing sidewall coverage during sputtering in a chamber having an inductively coupled plasma |
abstract |
A process for sputter depositing material into a workpiece structure having a sidewall, comprising: sputtering a target of a first metal which is at least 99.99% aluminum to form an underlayer comprising sputtered first metal on said workpiece; and depositing a second metal layer on said underlayer, wherein said second metal has a different composition than said first metal. |
priorityDate |
1997-01-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |