http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-451400-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_57341227c065dbddd1d3cf801bbaa86a |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-76 |
| filingDate | 2000-08-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2001-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7e228e8dbbd794c8927fe182f30ddb55 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fe9333d89954b24f4f8b8a3276824905 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9a13aec7cf9b11902f0b80f2229e9167 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6ff57f118e1cb8e85e147e00d1ac2536 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2b43c8b669dbad803180af26cd075097 |
| publicationDate | 2001-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-451400-B |
| titleOfInvention | Shallow trench isolation process with silicon nitride liner |
| abstract | For the void defects usually occurred in the shallow trench isolation process that uses silicon nitride liner, an ultra high temperature annealing process set between the wet dipping step of silicon nitride cap and the wet dipping step of pad oxide-layer is proposed in the present invention. In general, the temperature is higher than 1100 DEG C such that the isolating oxide layer, particularly the high-density plasma oxide layer or low-pressure tetra-ethyl-ortho-silicate, located on the top end of shallow trench is made to flow so as to fill into the fine and deep voids of the silicon nitride liner generated due to the partial etching. In this way, a flat surface can be generated on the top end of shallow trench such that the void defects can be avoided. Additionally, the quality of shallow trench isolation process can be increased. |
| priorityDate | 2000-08-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 27.