| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32192
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32357
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-511
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32862 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-511
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31 |
| filingDate |
1998-03-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2001-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d8a8620990cfe6563639ce2a2dafc416
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3caf4949343cc927db9d5c9ee5f8a5cf
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_02608ce4d13f7d8e0e7f3719e97a7f4d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_603ac6e3d8bd3e55b34f75efbe3be253
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1abcb2ae70c8fecd4791bf228b25942d |
| publicationDate |
2001-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-451286-B |
| titleOfInvention |
Apparatus and methods for upgraded substrate processing system with microwave plasma source |
| abstract |
An apparatus and methods for an upgraded CVD system that provides a plasma for efficiently cleaning a chamber, according to a specific embodiment. Etching or depositing a layer onto a substrate also may be achieved using the upgraded CVD system of the present invention. In a specific embodiment, the present invention provides an easily removable, conveniently handled, and relatively inexpensive microwave plasma source as a retrofit for or a removable addition to existing CVD apparatus. In a preferred embodiment, the remote microwave plasma source efficiently provides a plasma without need for liquid-cooling the plasma applicator tube. In another embodiment, the present invention provides an improved CVD apparatus or retrofit of existing CVD apparatus capable of producing a plasma with the ability to efficiently clean the chamber when needed. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I736829-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I417931-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I704636-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9333460-B2 |
| priorityDate |
1997-03-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |