| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L28-55 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10B53-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10B53-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-105
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L28-75 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-822
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-8246
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-115
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-105
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-10 |
| filingDate |
2000-03-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2001-06-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_02956e52140d6c8b8ea6649ae6767319
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f6dde291a279a740c5c71b96e369f2da
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f6fae6398daab99072f4611ae95e0efb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f34bf450ffd70f5148b6f16dc1567f41
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_040353a8e2fe4937ecc8ab09ebb9587d |
| publicationDate |
2001-06-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-442957-B |
| titleOfInvention |
Feram cell with internal oxygen source and method of oxygen release |
| abstract |
An integrated ferroelectric/CMOS structure which comprises at least a ferroelectric material, a pair of electrodes in contact with opposite surfaces of the ferroelectric material, where the electrodes do not decompose at deposition or annealing, and an oxygen source layer in contact with at least one of said electrodes, said oxygen source layer being a metal oxide which at least partially decomposes during deposition and/or subsequent processing is provided as well as a method of fabricating the same. |
| priorityDate |
1999-06-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |