http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-442894-B

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filingDate 1999-07-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2001-06-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_afb77215276e4b12c94ddfa2ad79b092
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_84136b1be68d4beb047b0da598314bdd
publicationDate 2001-06-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-442894-B
titleOfInvention Semiconductor integrated circuit capacitor and method of fabricating same
abstract A semiconductor integrated circuit capacitor is provided which includes an insulating substrate and a lower electrode disposed on a predetermined part of the insulating substrate. The capacitor also includes an interlevel insulating layer disposed on the insulating substrate and on the lower electrode, and a via hole having sidewalls, whereby the via hole passes through the interlevel insulating layer and exposes a predetermined surface of the lower electrode. The capacitor also includes a spacer disposed on the sidewalls of the via hole, and a dielectric layer disposed on: (i) a bottom surface of the via hole adjacent to the predetermined surface of the lower electrode; (ii) a predetermined part of the insulating layer; and (iii) the spacer. The capacitor also includes an upper electrode disposed on a predetermined part of the interlevel insulating layer and disposed on the dielectric layer. A method of making the semiconductor integrated circuit capacitor also is disclosed.
priorityDate 1998-10-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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