| abstract |
This lactone-containing compound is a compound of formula I, in which R1 is H, methyl, CH2COOR5 (R5 is a 1-15C straight, branched, or ring alkyl); R2 is H, methyl or COOR5, R3 is a 1-8C straight, branched, or ring alkyl; R4 is H or COOR5; X is CH2, CH2CH2, O or S. The compound serves as a monomer for obtaining a high polymer compound used as a base resin of a resist material, sensitive to a high energy ray, excellent in sensitivity, resolution and etching resistance and useful for a fine processing with an electron beam or a far ultraviolet ray. Especially, it has a low absorption to the exposure wavelength of the ArF laser, KrF laser and thus is easy to form fine patterns vertical to the substrate. |