| abstract |
The present invention is a matrix-type display device and the manufacturing method of the same, the object of the invention is to improve the patterning accuracy while maintaining the characteristics of low cost, high throughput and a high degree of freedom of an optical material. In order to achieve the object, a difference in height, a desired distribution of liquid repellency and lyophilicity, or a desired potential distribution is formed on the displaying substrate by utilizing the first bus lines in a passive matrix type display device or utilizing scanning lines, signal lines, common current supply lines, pixel electrodes, an interlevel insulation film, or a light shielding layer in an active matrix type display device. A liquid optical material is selectively coated at predetermined positions by utilizing the above means. |