http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-436876-B

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ddbd9538efce6e134d471b912946264e
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B3-102
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B3-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-322
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00
filingDate 1998-05-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2001-05-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_791c8b8cbe2eaefb755b7fde55eafd68
publicationDate 2001-05-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-436876-B
titleOfInvention Method and device for removing mobile ions in a wafer
abstract The present invention discloses a method and a device for removing mobile ions in a wafer. The device in the present invention includes a fluid supply nozzle for supplying a first fluid, a reaction area for transforming the first fluid into an active material with electric charges, and a wafer set for disposing the wafer electrically connected to a voltage and for inducing the mobile ions to move to the surface of the wafer, wherein the mobile ions can react with the charged active material formed in the reaction area to form a material which can escape from the wafer and the mobile ions thereof are removed.
priorityDate 1998-05-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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