http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-432256-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-72 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0226 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 1997-09-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2001-05-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_278135abcea06da9bc7ccfbae4bddad6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_abf92c6162f276a54a5782dd87f205c1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_464180103f87187b3aab20511a8537b7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_61eb1b5009be47cb05392bb6e31476c3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1e8c6788d846774f20e5ac920e2e11e3 |
| publicationDate | 2001-05-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-432256-B |
| titleOfInvention | Positive resist composition of chemical amplification type |
| abstract | Amplification type, comprising (a) an alkali-soluble resin having crosslinkage and groups which are decomposed by the action of an acid to increase the solubility in an alkali developer and (b) 0.1 to 20 wt.% of a compound represented by the following formula (I) or (II) which generates a sulfonic acid by irradiation with active rays or radiation; wherein R1 to R5 are the same or different, and each represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkoxy group, a hydroxyl group, a halogen atom or S-R6 group; R9 represents an alkyl group or an aryl group; and X<SP>-</SP> represents an anion of benzenesulfonic, naphthalenesulfonic or anthracenesulfonic acid having at least one substituent selected from the group consisting of branched or cyclic alkyl groups having at least 8 carbon atoms and branched or cyclic alkoxy groups having at least 8 carbon atoms, or at least two substituents selected from the group consisting of straight-chain, branched or cyclic alkyl groups having from 4 to 7 carbon atoms and straight-chain, branched or cyclic alkoxy groups having from 4 to 7 carbon atoms, or at least three substituents selected from the group consisting of straight-chain or branched alkyl groups having from 1 to 3 carbon atoms and straight-chain or branched alkoxy groups having from 1 to 3 carbon atoms. |
| priorityDate | 1996-09-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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