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publicationDate 2001-03-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-426557-B
titleOfInvention Method for cleaning semiconductor device
abstract A method is provided for treating a plurality of semiconductor substrates using the same aqueous SC-1 solution which solution removes and/or inhibits contamination of the semiconductor surfaces by metallic ions present in the solution or on the substrate surface comprising a basic solution containing hydrogen peroxide and an oxidation-resistant chelating additive such as CDTA in an amount effective to provide the desired treatment results. The SC-1 solution may be the conventional 5:1:1 (water: NH4OH:H2O2) solution or a dilute solution such as a 5:x:1 to 200:x:1 solution wherein x is 0.025 to 2.
priorityDate 1997-10-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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