| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-425 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-32 |
| filingDate |
1996-08-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2001-03-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_77105c72905466e2e6eb9436ecb7601d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e9da8ff6776a95c7ef10b2b92fadd34a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7f08ea87295ed56b59dae70df070c234
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_23c43aa3fe55d690d955960d87a560cc |
| publicationDate |
2001-03-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-425493-B |
| titleOfInvention |
Photoresist stripping liquid compositions and a method of stripping piiotoresists using the same |
| abstract |
The improved photoresist stripping liquid composition com-prises (a) 2-30 wt% of a hydroxylamine. (b) 2-35 wt% of water. (c) 2-20 wt% of an amine having an acid dissoclation constant (pKa) of 7.5-13 in aqueous solution at 25 DEG C. (d) 35-80 wt% of a water-soluble organic solvent and (e) 2-20 wt% of a corrosion inhibitor and the, method using this composition are capable of not only efficient removal of modified photoresist films that have been formed by dry etching, ashing, ion implantation and other treatments under hostile conditions but also effective prevention of the corrosion that would otherwise occur in substrates irrespective of whether they are overlaid with Al or Al alloy layers or Ti layers. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109407478-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-101971103-B |
| priorityDate |
1995-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |