http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-421872-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_38ed56a4b4e8e2315b2b3308bffedb3f |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-522 |
| filingDate | 1998-11-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2001-02-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_678e45403ff5a6a01ec6a54ed5bdb8b8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a9fc8ad13db4d99e3005b1174d4dddae http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7741dceba3a5e079e106e46d0699b0ea |
| publicationDate | 2001-02-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-421872-B |
| titleOfInvention | Process for forming the plugs with self-aligned contact window |
| abstract | The present invention discloses a process for forming the plugs with self-aligned contact window which includes the following steps: providing a substrate with semiconductor devices; forming a first insulation layer to adaptively cover the semiconductor substrate; sequentially forming a second and a third insulation layer on the first insulation layer; using photolithography process and etching to define a self-aligned contact window exposed on the substrate surface; forming a high temperature doped polysilicon layer on the surface of the third insulation layer and covering the inner wall and the bottom of the self-aligned contact window; forming a low temperature doped polysilicon layer on the high temperature doped polysilicon layer and filling up the self-aligned contact window; conducting a planarization process to remove the excess high temperature doped polysilicon layer and low temperature doped polysilicon layer and also part of the third insulation layer so as to form a plug in the self-aligned contact window. |
| priorityDate | 1998-11-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 32.