http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-418296-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b7317808024e524eea40a6c5a5ad6a22 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F16K3-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F16K51-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/F16K3-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/F16K51-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/F16K3-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G05D16-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/F16L55-00 |
| filingDate | 2000-03-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2001-01-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cb2a6a61b3c02be8c0248271ab0efade |
| publicationDate | 2001-01-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-418296-B |
| titleOfInvention | A low-pressure apparatus for carrying out steps in the manufacture of a device, a method of manufacturing a device making use of such an apparatus, and a pressure control valve |
| abstract | A low-pressure apparatus for carrying out steps in the manufacture of a device, in particular, but not exclusively, a semiconductor device, which steps are performed under a prescribed pressure, the apparatus comprising: a reactor chamber (1) for accommodating a body (2), a gas supply pipe (4) for introducing a process gas flow, which gas supply pipe (4) is connected to the reactor chamber (1), an exhaust pump (5) for evacuation, which exhaust pump (5) is connected to the reactor chamber (1) through an exhaust pipe (6), a pressure control valve (9) for adjusting a valve opening, which pressure control valve (9) is provided on the exhaust pipe (6), the pressure control valve (9) comprising a flow channel (10), a first flow-through element (11) and a second flow-through element (12), which first flow-through element (11) and second flow-through element (12), are arranged behind each other in the flow channel (10) in the direction (13) of the gas flow and border respectively a first flow-through opening and a second flow-through opening, at least one of the first flow-through element (11) and the second flow-through element (12) being movable substantially transversely to the direction (13) of the gas flow in order to establish a desired overlap between the first flow-through opening, the flow-through opening and create a common opening referred to as the valve opening, the flow-through opening at least being provided with a first opening portion bordered by two first edges, which mutually taper into a pointed end, whereby the movable flow-through element at least is adjustable in a position in which the valve opening exclusively comprises only the pointed end of the first opening portion, a pressure sensor (7) for monitoring the pressure inside the reactor chamber (1), and control means (8) for controlling the valve opening of the pressure control valve (9) in dependence on the monitored pressure relative to the prescribed pressure as a target. |
| priorityDate | 1999-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 30.