http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-416897-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-32 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate | 1999-10-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2001-01-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_47e4f43a1c78723d60c1bf119051b2b8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bd847df814393c27121f2db1527ccc8b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3c2709ae605b08d514c83dfc53fdc5ad |
| publicationDate | 2001-01-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-416897-B |
| titleOfInvention | A carrier head with edge control for chemical mechanical polishing |
| abstract | A carrier head, particularly suited for chemical mechanical polishing of a flatted substrate, includes a flexible membrane and an edge load ring. A lower surface of the flexible membrane provides a receiving surface for a center portion of the substrate, whereas a lower surface of the edge load ring provides a receiving surface for a perimeter portion of the substrate. A slurry suitable for chemical mechanical polishing a flatted substrate includes water, a colloidal silica that tends to agglomerate, and a fumed silica that tends not to agglomerate. |
| priorityDate | 1998-11-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 26.