http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-415025-B
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_88fc7f9eb617072238851d46591a0c76 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 |
filingDate | 1999-03-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2000-12-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ce960eddc3bf2968611bdb2c8a10df71 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9dfce7a0650570c72018819595023d6d |
publicationDate | 2000-12-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | TW-415025-B |
titleOfInvention | Manufacture of adhesion layer |
abstract | A method of forming an adhesion layer and a barrier layer is provided. A titanium layer is formed over a substrate having a via hole or a contact opening by sputtering through a collimator. A titanium nitride layer with nitrogen is formed on the titanium layer by controlling the flow rate of nitrogen and the argon during sputtering. A treatment is performed on the titanium nitride layer having nitrogen and the exposed titanium layer by RF nitrogen plasma such that the titanium nitride layer is strengthened and the exposed titanium layer becomes titanium nitride layer. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102446841-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102446841-B |
priorityDate | 1999-03-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 36.