| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e415f6f1eeb8706d299ea086326248bf |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0226
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0048 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F212-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
1998-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2000-11-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a1d9edb481734fa88202c2cea2b3481c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e6342379f267837e4951da7476d052b4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_756389a1c098d1b88329d479936d2c5c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9f07976cb3a72776daa97e5e4a9a1cce |
| publicationDate |
2000-11-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-411405-B |
| titleOfInvention |
Novel polymers and photoresist compositions, and method for forming positive photoresist relief image |
| abstract |
The present invention provides novel polymers and chemically-amplified positive-acting photoresist compositions that contain such polymers as a resin binder component. The polymers of the invention include acid labile groups that contain isobornyl moieties and groups that contribute to aqueous development of a photoresist such as phenolic groups. The present invention also provides a method for forming a positive photoresist relief image by using the novel photoresist compositions. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8198004-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7501220-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I694167-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I717260-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7527909-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7541138-B2 |
| priorityDate |
1997-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |