http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-409354-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_88fc7f9eb617072238851d46591a0c76 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 |
| filingDate | 1999-01-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2000-10-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cadcadea38f2cfc973260587c4b40218 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_91e1aa30bfeb9910871a524ac5a347ab |
| publicationDate | 2000-10-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-409354-B |
| titleOfInvention | Metalization method of contact window |
| abstract | A metalization method of contact window is disclosed. It uses the metal plasma to deposit a metal layer on the opening of the contact; then, using the chemical deposition method to deposite a nitration metal layer as the barrier layer of metal plug. Then, ammonia gas, is used to strengthen the structure of the barrier layer using rapid thermal nitration method; meanwhile, make the metal in the bottom of the contact forming silicide on the surface of the substrate. |
| priorityDate | 1999-01-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 27.