http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-389930-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c16d2144a81bfa32a665dca1e93c3d37 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S134-902 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-3021 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 1997-04-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2000-05-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d9b7778fb72dd5619a9f174e92ceecec http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6783aa91a6c62d53d66425ed74850c11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_29ea7c82b3a3390cbef5a478e16181ee |
| publicationDate | 2000-05-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-389930-B |
| titleOfInvention | Developing solution feed system for semiconductor photolithography process |
| abstract | Disclosed is a developing solution feed system for a semiconductor photolithography process in which the developing solution is fed with its contained gas removed. The inventive developing solution feed system comprises a plurality of feed tanks and a developing solution feed line having a plurality of first connecting pipes, each connected to the feed tanks, a second connecting pipe connected to the first connecting pipe to be converged into one passage, and a plurality of third connecting pipes diverged from the second connecting pipe. The system also comprises nozzles connected to the third connecting pipe of the developing solution feed line to thereby sputter the developing solution on wafers each located in process chambers, a gas removal device installed in the second connecting pipe of the developing solution feed line to thereby remove gas contained in the developing solution, and shut off valves, each installed in the third connecting pipes to thereby open and close passages, so that the developing solution can selectively be fed into only one process chamber through the third connecting pipes. |
| priorityDate | 1996-09-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 21.