http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-388069-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d2356dc75860e91f1098f7d8427429c6 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-203 |
| filingDate | 1996-03-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2000-04-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1a4d1677796aaa449280e2f8c318d085 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ab3444f4e63f9d4a7abee925008cb8c6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_be48cde1c4be3f7fa99ecb03b3f3e00a |
| publicationDate | 2000-04-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-388069-B |
| titleOfInvention | Titanium target for use in sputtering and manufacture thereof |
| abstract | The pesent invention is to provide a titanium target for use in sputtering which has a high efficiency in forming film inside the contact hole. The crystal on the target surface is so oriented that the X line diffraction strength of (10-10) and/or (11/20) vertical to the densest loading surfacee becomes 1.1 times of the random orientation, and the X line diffraction strength of (0002) parallel to the densest loading surface becomes less than one time. The direction of sputering particles jetted out of the target surface is controled to be vertical to said target surface. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111108231-A |
| priorityDate | 1996-01-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 26.